XPS, ARPES, MOKE, FTIR, and surface characterization systems
Stand-alone analysis chamber with load-lock for XPS, UPS, ARPES, AES, EELS, ISS, IPES and LEIPS in UHV.
Multi-chamber photoelectron spectroscopy designed for maximum compatibility with other surface science techniques.
Photoelectron spectroscopy from UHV to 50 mbar with a versatile gas cell, for research on gas–solid and gas–liquid interactions.
Modular UHV tribometer for friction, wear, indentation, and fracture studies from 10⁻⁹ mbar to 1 atm and -120 °C to 600 °C, with a 6-axis force sensor and closed-loop load control.
Stand-alone UHV unit for temperature-programmed desorption: adsorption and desorption measurements on ultrathin films.
UHV-compatible infrared spectroscopy for surface adsorbate and thin film vibrational analysis.
Real-time magneto-optical Kerr effect measurements on ultra-thin magnetic films and multilayers.
High-pressure photoelectron spectroscopy from UHV to 50 mbar, bridging surface science and near-ambient studies in one instrument.